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| As
a super supplier of semiconductor-related materials, we
supply silicon wafers and a wide variety of materials
indispensable to the manufacture of semiconductors. We
also supply gases, chemicals, fixtures, etc. for use in
production processes. |
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Semiconductor materials
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300mm silicon wafers
With the arrival of the era of full-scale mass production of 300mm wafers, customers' expectations on silicon wafers are increasingly high. As a pioneer in the world silicon market, Shin-Etsu Handotai (SEH) took the head start of the mass production of 300mm and has established a system ensuring a stable supply to the market. In responding to even higher requirements from the customers for the future, we continue the incessant efforts and challenges for the quality improvements.
<Features>
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We have
respond to the growing market demand in timely manner with our
capacity expansions since the starting of the mass
production in February 2001. |
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Our products
can meet the 0.13um design rule process and beyond. |
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Our product
portfolio covers wide range of the customers' various requirements. |
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<Applications>
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Substrates for memory
devices, microprocessor devices, etc. |
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<For More Information>
Semiconductor Materials Devision
Phone:
+81-3-3246-5211 |
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IG-NANA wafers
IG-NANA wafers (annealed wafers) can be used in wide range of device processes, from high-temperature processes to lowtemperature processes. This product can provide high device performances at a reasonable cost.
<Features>
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Enhancement of the
"getter effect" is achieved with the presence
of highly-densed and highly uniformed BMD in the bulk. |
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The surface layer is defect-free. |
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Suitable for advanced
technology processes with narrow design rule |
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Available also in 300mm |
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<Applications>
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ubstrates for memory
devices, logic devices, etc. |
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<For More Information>
Semiconductor Materials Devision
Phone:
+81-3-3246-5211 |
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SOI (Silicon On Insulator) wafers
SOI wafers, with the structure having insulated oxide film under active silicon layer, are promising semiconductor material for leading edge devices such as high speed and low power consumption LSI, smart sensors, smart power devices and MEMS.
<Features>
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Excellent thickness
uniformity of SOI layer |
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SOI crystal quality
equivalent to bulk Silicon wafers |
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Buried oxide film quality
being equivalent to thermal oxide |
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Available for volume
supply |
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<Options: the customers
can specify the following items>
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SOI layer thickness
and resistivity |
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Specification of base
and bond wafer |
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Buried oxide layer
thickness |
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<Applications>
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High speed/low power/low
voltage Ics |
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System-On-Chip LSI |
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High-temperature electronics |
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Radiation-hardened
circuits |
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Smart power devices |
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Smart sensors |
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<For More Information>
Semiconductor Materials Devision
Phone:
+81-3-3246-5211 |
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Compound semiconductor materials
Shin-Etsu Handotai (SEH) produces light emitting element materials such as gallium phosphide (GaP), gallium arsenide phosphide (GaAsP) and aluminum gallium indium phosphide (AlGaInP) products, which are used in light emitting diodes and lasers in the optoelectronics field. These materials possess unique functions that cannot be found in silicon semiconductors. In addition to these materials, SEH has a lineup of chips, which are one step nearer to devices.
<Features>
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The materials cover
the fields of GaP, GaAsP and AlGaInP. |
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Integrated production
of crystal, substrate, epitaxial wafer and chip is realized. |
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The brightness, color
tone and electric characteristics are ensured by excellent
crystal technology, growing technology of liquid phase and gaseous
vapour phase epitaxial wafers, and machining technology
in each manufacturing process. |
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These characteristics
are well received both in Japan and abroad. |
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<Applications>
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For visible light,
infrared ray, functional use etc. |
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<For More Information>
Semiconductor Materials Division
Phone:
+81-27-385-2970
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Junction coating resins
Junction coating resins help to improve the reliability of semiconductor devices. They provide electrical protection of semiconductor chips, improve moisture-resistance, reduce mechanical stress, and prevent software error of VLSI.
<Features>
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High purity, together
with excellent adhesive capability and working property |
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<Applications>
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Surface coating materials
for semiconductor elements |
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Circuit protection,
sealing and other uses for optical devices and flat panel display
(LCD, PDP, EL, etc.) panels |
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Epoxy molding compounds
These encapsulating materials provide low stress, low alpha-ray property and high thermal conductivity.They are also environmentfriendly.
<Features>
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Superior moisture resistance,
electrical characteristics, and moldability. This
material meets the high requirements for resin encapsulation
of devices. |
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By introducing a new,
original flame-retardant system, this product is free
from halogen and antimony trioxide. |
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<Applications>
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D-RAM and other LSI
molding, full pack molding for power devices etc. |
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Liquid epoxy encapsulating materials
This is a liquid epoxy resin encapsulating material for the protection and adhesion of semiconductor devices.
<Features>
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Excellent low stress,
adhesive, and penetration property |
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<Applications>
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Under filling, COB
potting, hermetic seal, and other uses for electrical or mechanical
protection and highly reliable adhesion of semiconductor devices |
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True spherical shape ultra-fine particulates "ADMAFINE"
ADMAFINE is true spherical shape ultra-fine particulates produced using a special process of oxidize metallic powder. Admatecs, a joint venture of Toyota Motor, Shin-Etsu Chemical, Shin-Etsu Quartz Products and Tatsumori, succeeded in commercial production of this product as a pioneer in the world.
<Features>
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The true spherical
shape ultra-fine particulates have a sharp granular distribution,
capable of improving the toughness, flowability, thermal conductivity
and other physical properties of composite materials. |
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Not only simple oxide
but also of composite oxide fine spherical particulates can be
produced. |
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It is possible to coat
the particles with various types of composites or classify the particles. |
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<Applications>
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Filler material for
semiconductor enclosure applications |
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Filler material for
precision resin molding applications |
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Anti-blocking materials |
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Sintering materials |
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Manufacture process materials
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Synthetic quartz glass substrates
Shin-Etsu Chemical is a top-ranking manufacturer of synthetic quartz photomask substrates for IC and synthetic quartz large photomask substrates for LCD. For over 20 years, we have offered a stable supply of top quality substrates. Synthetic quartz wafers mainly used in high-temperature poly-Si TFT-LCD are now available up to 300mmΦ in diameter, meeting the wide range of requirements from customers.
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Synthetic quartz photomask substrates
This substrate excels in the permeability and low thermal expansibility in the far-ultraviolet range. It is suitable as photomask substrates for optical lithography and other applications that require ultra-high purity and high precision polishing (flatness processing at a submicron level).
<Features>
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It has ultra-high purity,
and contains no bubble, foreign matter and stria. |
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Surface defects: For
IC ≤ 1 µ m (SZS grade) and ≤ 2 µ m (SMS grade). |
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For LCD≤ 2µm
(SMS grade). |
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Flatness: Various lineups
are available. |
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<Lineup>
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Synthetic quartz photomask
substrates for IC |
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Synthetic quartz photomask
substrates for g line, i line, KrF (248 nm) lithography |
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Synthetic quartz photomask
substrates for ArF (193 nm) lithography |
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Synthetic quartz photomask
substrates for F2 (157 nm) lithography |
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Synthetic quartz photomask
substrates for LCD |
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Synthetic quartz photomask
substrates for TFT |
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Synthetic quartz photomask
substrates for Color Filter |
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<For More Information>
Opto-Electronics Materials Dept.II,
Advanced Materials Division
Phone:
+81-3-3246-5222 |
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Synthetic quartz wafers
This wafer has excellent thermal resistance and light transmission properties. It is most suitable as wafers for high temperature poly-Si TFT-LCD and other applications that require high purity and high precision polishing.
<Features>
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It is an ultra-high
grade product free from bubble and foreign matter. |
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Compared with ordinary
glass, it possesses a low thermal expansion and extremely
high permeability over the whole wavelength range from
ultraviolet to infrared region. |
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We have two grades
for wafers, which are VIOSIL-SQ and VIOSIL-SX. VIOSIL-SQ
is same material as synthetic quartz photomask substrate.VIOSIL-SX
is improved material for heat resistance to support
the use in the high temperature range (1,000ºC or higher). |
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<Lineup>
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External diameters
from 3"φ(76.2 mm) to a maximum of 12"φ (300
mm) are included in the lineup. Other sizes are also available. |
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<For More Information>
Opto-Electronics Materials Dept.II,
Advanced Materials Division
Phone:
+81-3-3246-5222 |
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Semi-transparent quartz crucibles for
silicon single crystal pulling applications
The same silica raw material as transparent
quartz glass is used.
The manufacturing method is unique.
<Features>
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The purity is the same
as the transparent quartz glass product. |
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The internal surface
has a smooth transparent layer containing no bubbles. |
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<Lineup>
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Various sizes can be
produced, with external diameters up to 40 inches to accommodate
silicon ingot for the next generation large diameter wafers. |
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Various grades depending
on the uses, ranging from standard products to ultra-high
purity products |
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Quartz glass for semiconductor production processes
Technological innovation continues in the field of semiconductor; with horizontal furnaces being replaced by vertical furnaces, wafer size evolving toward larger diameters, and so forth. We are meeting the changing demands by a broad range of product configuration and excellent processing technology.
<Features>
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Various grades of natural
quartz and synthetic quartz are available, ranging from general
products to ultra-high purity products. |
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Specially processed
products with improved heat resistance and anti-plasma property
are also available. |
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<Applications>
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Furnace tubes and boats
used in the oxidation/diffusion process or CVD process |
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Wet cleaning tanks
used in cleaning processes such as chemical treatment
and ultra-pure water cleaning |
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Various parts used
in dry etching |
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Silicon wafer carrier
and semiconductor-material container
300mm Front Opening Unified Pod-FOUP
300mm Front Opening Shipping Box-FOSB
These are carrier and containers for storing and transporting highpurity materials such as silicon wafers, synthetic quartz mask substrates and other high quality chemical material used in semiconductor industry.
<Features>
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Unique high-purity
plastic materials |
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Manufactured in clean
room environment |
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SEMI standard and automation
optimized design |
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<Applications>
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125/150 /200/300 mm
wafer shipping box |
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300mm FOUP |
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Mask substrate container |
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Reticle container,
and others |
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Silicon wafer case pouches
These are packaging bags for semiconductor silicon wafer cases, for which high levels of cleanliness and air-tightness are required.
<Features>
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The products are manufactured
in a clean environment within the clean room (class
1,000) using clean film as raw material, and the manufacturing
process and quality are evaluated. |
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<Applications>
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For packaging of silicon
wafer case |
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Photoresists
Drawing upon the extensive electronic material expertise acquired in the chemical manufacturing field, we offer the latest high-quality and high-performance KrF, ArF and F2 photoresists and other materials related to semiconductor production processes.
<Features>
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It is applicable to
the excimer laser process for processing designs at 0.18μm
or below. |
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We also manufacture
polymers and photoresist ingredients using technology developed
at our company. |
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We conduct the whole
production process from polymerization of raw material to
finished products. |
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<Applications>
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Semiconductor lithography
process for the manufacture of memory and logic devices |
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<For More Information>
New Functional Materials Department
Phone:
+81-3-3246-5346 |
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Pellicles
Pellicle is a high-quality cover for the protection of photomasks against dust, which was developed based on the know-how accumulated from the development and manufacture of various electronic materials. In addition to the grade for g/i-line and the KrF excimer laser grade, the ArF excimer laser grade is also available. Through consolidated quality design, we are equipped to meet all the high level needs of our customers.
<Features>
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Pellicle membrane has
high transmission and excellent laser durability. |
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Adhesives for fixation
of the membrane and for mounting on photomask have excellent
light resistance quality, and were developed independently
by our own technology. |
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Special processing
of the frame surface prevents generation of particles. |
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Pellicle container
was uniquely designed and is made of antistatic and dust-free materials
(adaptable to auto-mounter). |
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<For More Information>
Special Functional Products Dept.
Phone:
+81-3-3246-5345 |
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Pyrolytic boron nitride (PBN)
The product is a kind of ceramics manufactured with a thermal decomposition under reduced pressure. It is mainly used for breeding III-V compound semiconductor crystals such as GaAs, which are attracting more and more attention as an element for the mobile communication MMIC or for optical devices.
<Features>
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The product is pure
and stable chemically. |
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Excellent in high temperature
strength |
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Excellent in insulation
property and thermal conductivity |
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<Applications>
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For pulling of single
crystals of the III-V group semiconductor |
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As dopants for doping
of boron into silicon wafers |
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As crucibles for impurity
analysis |
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As crucibles for organic
EL |
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<For More Information>
Opto-Electronics Materials Dept.I,
Advanced Materials Division
Phone:
+81-3-3246-5223 |
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PG/PBN heater
The product is a ceramic heater made by laminating two kinds of ceramics (PBN, PG), manufactured by the pressure reduced heat decomposition CVD method.
<Features>
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A large type heater
up to a maximum diameter of 380 mmφ |
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It is highly strong
against thermal impact. |
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It is highly pure chemically
and no outgassing occurs |
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(being able to cope
with high vacuum). |
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Heater pattern may
be designed freely, and its allowable highest temperature is 1,600ºC. |
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A substrate heater
and a pipe heater are available. |
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<Applications>
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Substrate heater for
spatter, CVD equipment and others in semiconductor production
processes |
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Small heaters, substrate
and tube, for special uses in high vacuum process |
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<For More Information>
Opto-Electronics Materials Dept.I,
Advanced Materials Division
Phone:
+81-3-3246-5223 |
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High-Purity Silicon Parts
High-purity silicon parts are used in the electrodes in the upper part of
the etching equipment used in the semiconductor production process and in
the focus ring which ensures uniformity of etching on the periphery of the
wafer. Shin-Etsu Chemical handles the entire production process; from
silicon ingots to silicon parts, and provides a steady supply of large
diameter, high purity products.
<For More Information>
Opto-Electronics Materials Dept.I,
Advanced Materials Division
Phone:
+81-3-3246-5223 |
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Carrier tapes
It is the package materials for transporting semiconductor devices and various surface-mounting electronic devices(SMD).
<Features>
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This carrier tape can
be used in BGA, CSP, WL-CSP and other high-tech packages.
Design based on our unique simulation is offered. |
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Considering PKG visual
inspection of the taping process, |
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we offer carrier tapes
suitable for image recognition. |
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They help to improve
the yield of inspection in the taping process. |
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<Lineup>
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General grade for passive
components and conductive grade for semiconductor devices
are available. |
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Broad carrier tape(over
56mm width) for various mechanical components |
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Silicon carbide abrasive powder
"SHINANO-RUNDUM" is an abrasive powder produced by the following procedures. Only the selected crystal portion is extracted from the ingot of black or green silicon carbide. They are crushed, ground to fine powder, treated chemically, graded, filtered and dried.
<Lineup>
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CP and GP are made
from black and green silicon carbides, |
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respectively. CP and
GP are different in crystalline property. |
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CP is tough, while
GP is harder and more brittle. |
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<Applications>
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Wire-saw slicing of
semiconductor silicon ingot etc. |
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<For More Information>
Shinano Electric Refining Co., Ltd.
Phone:
+81-3-5298-1601
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High-purity silane
This is used in a wide range of industries such as electronics, chemical, ceramics, and metal industries. A lineup of tetrachlorosilane, richlorosilane, dichlorosilane etc. is available.
<Features>
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It has a wide range
of application, depending on the kind of silane. |
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<Applications>
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Semiconductor insulation
layer, epitaxial layer etc. |
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Tetrachlorosilane is
used for optical fibers. |
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Tetrachlorosilane and
trichlorosilane are used for chemical products such as fine
ceramics etc. |
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<For More Information>
Organic Electronics Materials Dept.,
Electronics Materials Division
Phone:
+81-3-3246-5231
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Shin-Etsu high-purity organometallics
Organometallics precursors are used to produce thin film compound semiconductors with MOCVD technique. We have seven products, which are TMGa, TEGa, TMIn, TMAl, DMZn, DEZn and TBP.
<Features>
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For all the sorts of
the compound, high purity of less than 0.1-ppm metallic impurities
is assured. |
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Solid raw material
TMIn has also accomplished the feed stability of ±0.002
vol%(20ºC) by improving of containers and devising filling
method. |
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Low oxygen TMAl has
been developed by our unique method. |
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TBP is a safe liquid
raw material substituted PH3. |
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We are now coping with
user's needs with our unique technology and high-level analyzers. |
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<Applications>
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HEMT, FET, Laser, High-brightness
LED, Solar cells, etc. |
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<For More Information>
Opto-Electronics Materials Dept.II,
Advanced Materials Division
Phone:
+81-3-3246-5222
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High-purity chloromethane
Using natural gas found near the Naoetsu Plant of Shin-Etsu Chemical, chlorine, methanol, and hydrochloric acid as raw materials, our unique reaction technology, advanced refining techniques, and development of excellent stabilizers enable us to supply products at stable, high quality. The products include methylchloride, methylenechloride, and chloroform.
<Features>
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As a solvent, it has
very strong dissolving capability. |
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It has wide application
as reaction raw materials. |
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It is used as a reaction
solvent in order to improve the yield. |
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Because of the low
boiling point, it is used as a low-temperature extraction solvent. |
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<Lineup and applications>
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Methylchloride is used
as reaction raw materials for silicone, methylcellulose, agricultural
chemicals, surfactant, and perfume, as well as a low-temperature
extracting solvent for caffeine, etc. |
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Methylene chloride
is used as a reaction solvent for plastics, medicine, agricultural
chemicals, and perfume, as well as a precision washing solvent for
electronic equipment and optical instruments. |
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Chloroform is used
as a reaction solvent and extraction solvent for drugs, agricultural
chemicals, dyes, and perfume, as well as a reaction raw material
for fluorocarbon resin. |
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<For More Information>
Chlor Chlor, Alkali & Derivatives Dept.,
PVC Division
Phone:
+81-3-3246-5081
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