| 1927 |
Naoetsu Plant begins production of carbide and lime nitrogen fertilizer |
| 1939 |
Manufacture of ferrosilicon begins |
| 1953 |
Silicone production facilities established |
| 1957 |
PVC, caustic soda and chlorine production begins |
| 1960 |
Manufacture of high-purity silicon begins
Production of vinyl acetate and polyvinyl alcohol starts |
| 1962 |
Manufacture of cellulose derivatives begins |
| 1963 |
Production of plaster-use hi-Metolose begins |
| 1965 |
Gastrosoluable coating agent pharmacoat developed |
| 1967 |
Start of manufacture of high-purity yttrium and other rare earths |
| 1972 |
Rare-earth magnets developed
Production of HPMCP begins |
| 1973 |
Epoxy molding compounds developed |
| 1976 |
Irone synthetic aroma developed |
| 1977 |
Commercialization of L-HPC |
| 1979 |
Production of synthetic quartz glass for IC photomask begins |
| 1980 |
Synthetic pheromones developed |
| 1981 |
Silicon nitride powder developed
Cast iron wire inoculation agent developed |
| 1982 |
HEMC production begins |
| 1984 |
Lithium tantalate (LT) developed |
| 1985 |
Ultra-high-purity PBN development
PVC shrink film developed |
| 1986 |
Materials for flexible printed circuit boards developed |
| 1991 |
High-performance neodymium-iron-boron magnets produced commercially |
| 1993 |
Preform manufacturing for optical fiber begins |
| 1994 |
Protective covers and pellicles for photomask developed |
| 1998 |
Commercialization of photoresist |
| 1999 |
Liquid fluoroelastomer developed |
| 2000 |
Optical communication component business launched |
| 2001 |
300mm silicon wafer production initiated |
| 2005 |
New high-performance technology for neodymium rare earth magnets developed |
| 2007 |
Optical isolators complying with the RoHS Directive developed
Leading-edge photomask blanks developed with Toppan Printing
|
| 2008 |
2008 The world’s largest class permanent magnet-type magnetic circuit developed |
